Product Parameters

Product Features

Hafnium Nitride Nanometer（HfN)Using aerosol ablation methodPreparation: High purity, small particle size, uniform distribution, large specific surface area, and high surface activity. Gray powder, cubic crystal structure. Relatively stable, but easily corroded by aqua regia, concentrated sulfuric acid, and hydrofluoric acid. Produced by hafnium and nitrogen in900℃It is produced through direct reaction or by reacting hafnium halides with ammonia or a mixed gas of nitrogen and hydrogen. It is an important component of refractory hafnium alloys.

Product Applications

1-nanometer hafnium nitride exhibits excellent mechanical, electrical, optical, high-temperature resistance, and corrosion resistance properties, making it highly significant for applications in fields such as mechanical manufacturing and microelectronics.

2-nanometer hafnium nitride can be widely applied in numerous fields such as semiconductors, optoelectronics, and mechanical processing.

Due to its integration of multiple excellent mechanical, thermal, optical, and corrosion- and wear-resistant properties, 3-nanometer hafnium nitride film is expected to become an efficient anti-reflective protective coating material for optical windows, which can be applied to key optical components in aerospace.

Packaging and Storage

This product is filled with inert gas.Plastic bagPackaging: Store sealed in a dry, cool environment. Avoid exposure to air and prevent moisture-induced oxidative agglomeration, which may affect dispersion performance and usability. Packaging quantities can be provided according to customer requirements, including sub-packaging.。