**Product Overview:**

Silica sol is a dispersion of nano-silica in water or non-aqueous solutions, widely used across various industries. The main production processes for silica sol include the silicon powder method, water glass method, and sol-gel method, each with its own advantages and disadvantages. Traditionally, ordinary silica sol is prepared using the first two methods. Although these processes are mature and cost-effective, the final silica sol products contain high levels of impurities and generate significant wastewater during production, limiting their use to conventional industrial applications. To produce high-purity (99.9999%) electronic-grade silica sol, we have developed a sol-gel production technology with independent intellectual property rights. Our high-purity silica sol can be used for precision polishing (CMP) of semiconductor materials, as well as in the solar energy and other industries. We can precisely control various characteristics of the silica sol, such as particle morphology ranging from spherical to dumbbell-shaped or chain-like, with a concentration of up to 40% solid content (typically 20-30%), particle sizes from below 10 nanometers to micron levels (typically 10-100 nanometers), impurity content controlled to below 1 part per million, adjustable porosity of SiO₂ particles, and dispersion media that can be water or non-aqueous solvents such as alcohols. Unlike traditional silica sol products, our silica sol can be neutral, alkaline, or acidic. ND-0301 and ND-0303 hold over 70% of the market share in the domestic solar energy sector.

Application Areas:

It can be widely used as a bonding, filling, coating, polishing, and other materials in fields such as chips, metal/ceramic processing, ink, coatings, textiles, printing, batteries, refractories, and even biomedicine.