Post Demand

Japan IMT Sample Dryer U-104

price  Grid 
¥50000.00
Brand:
日本IMT
Model:
U-104
Processing capacity:
1000
energy consumption:
600
Drying medium:
Other
Applicable Materials:
granular
Operation method:
Other
Working principle:
Other
Shenzhen Qiushan Industrial Equipment Co., Ltd.
Shop owner:Manager Deng
Address:No. 1002, Building 2, Hejian Yungu, Xinwang Road, Xinsheng Community, Longgang Street, Longgang District, Shenzhen
  • Product Introduction

Main Features

  1. High-Power Hot Air System

  • The total power reaches1200W(Heater 600W + Blower 600W), heats up quickly, reaching approximately 70°C in about 5 seconds.。

  • Wind speeds reaching as high as120 m/sair volume0.7m³/min, achieving rapid air drying。

  • Design of Air Curtain Nozzle

    • Adopt12 cm wide nozzle, forming a knife-like airflow to effectively remove moisture from the sample surface and prevent water droplet residue.。

  • Clean Air Filtration System

    • Built-inClean the air filter.Effectively filters dust and impurities from the air, preventing secondary contamination of samples.。

  • Anti-oxidation and Safety Protection

    • The hot air is activated only during ejection to prevent the sample from oxidizing due to prolonged heating, thereby protecting the quality of the observation surface.。

    • HaveAutomatic safety feature for when the heater is left on, optionalFoot switch, enhance operational safety.。

  • Compact design, easy to operate.

    • The size isW200×D438×H345mm, weight only15kg, space-saving, suitable for laboratory benchtop use。

    • Optional switch for improved operational efficiency.


    ? Technical Parameters

    Table

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    Project Parameter Description
    Power supply Single-phase 100–115V, 50/60Hz
    Total power 1200W (Heater 600W + Blower 600W)
    Wind Speed / Air Volume 120m/s,0.7m³/min
    Nozzle width 12cm (air curtain type)
    Heating time Approximately 5 seconds to 70°C
    Size/Weight W200×D438×H345mm / 15kg
    Optional Features Foot switch, toggle switch

    ? Application Areas

    • Semiconductor wafers, compound semiconductors

    • Liquid crystal panels, glass substrates

    • Precision grinding samples of metals, ceramics, silicon wafers, etc.

    • Suitable for rapid drying treatment before tissue observation.


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