1. Introduction to Hafnium Dioxide

Hafnium dioxide is an inorganic compound with the chemical formula HfO2. It is an oxide of the element hafnium and appears as a white solid under normal temperature and pressure.

Difficult to dissolve in water, insoluble in hydrochloric acid and nitric acid, but soluble in concentrated sulfuric acid and hydrofluoric acid.

Appearance: White powder

Applications: Infrared coating materials, high-temperature structural materials

Specification: 99% to 99.99% (calculated by subtraction method, excluding gaseous elements)

Features: High purity (99.99%), small particle size (30nm), low zirconium content (200ppm-2000ppm)

Chemical formula: HfO2

Molecular weight: 210.49

II. Introduction to Hafnium Dioxide Parameters

III. Application Fields of Hafnium Dioxide

Hafnium dioxide (HfO₂) is a ceramic material with a wide bandgap and high dielectric constant, which has recently been widely used in the industry, particularly in the field of microelectronics.

It has attracted great attention because it may replace the core device of silicon-based integrated circuits, the metal-oxide-semiconductor field-effect transistor (MOSFET).

The gate insulating layer uses silicon dioxide (SiO₂) to address the scaling limitations of the traditional SiO₂/Si structure in MOSFETs.